논문 코퍼스 검수 · QM Process Lab

QQM Process Lab/ 논문 코퍼스 검수

예측 엔진(Engine A)이 사용하는 CFD·ALD 논문 규칙 데이터베이스입니다. AI가 논문 전문을 읽고 추출한 규칙을 사람이 확인하는 검수 단계로, 각 카드를 펼쳐 내용을 확인하고✓ 승인또는✗ 수정 필요를 눌러 주세요. 승인된 규칙만 정식 예측에 반영됩니다.

추출 논문

110편

추출 규칙 (정량+정성)

1295건

Al₂O₃ 직접 관련

13편

검수 승인

0/110

Multiscale computational fluid dynamics modelling of spatial atomic layer deposition processes: Application to chamber design and process control

Accelerating Precursor Delivery in Atomic Layer Deposition via Charged-Volume Architectures: A Multiscale CFD-DFT Study

Density Functional Theory (DFT)-enhanced computational fluid dynamics modeling of substrate movement and chemical deposition process in spatial atomic layer deposition

Numerical study on the effectiveness of precursor isolation using N2 as gas barrier in spatial atomic layer deposition

Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films

Effects of gap size, temperature and pumping pressure on the fluid dynamics and chemical kinetics of in-line spatial atomic layer deposition of Al2O3

Optimizing the process efficiency of atomic layer deposition of alumina for its sustainability improvement: a combined experimental and modeling study

Experimental and numerical investigations into the transient multi-wafer batch atomic layer deposition process with vertical and horizontal wafer arrangements

Mechanistic modeling of atomic layer deposition of alumina process with detailed surface chemical kinetics

On the physical and chemical details of alumina atomic layer deposition: A combined experimental and numerical approach

Multiscale CFD Modeling of Area-Selective Atomic Layer Deposition: Application to Reactor Design and Operating Condition Calculation

Multiscale Modeling of Spatial Area-Selective Thermal Atomic Layer Deposition

Machine learning-based run-to-run control of a spatial thermal atomic layer etching reactor

Microscopic and data-driven modeling and operation of thermal atomic layer etching of aluminum oxide thin films

Multiscale computational fluid dynamics modeling of spatial thermal atomic layer etching

Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design

Multivariable run-to-run control of thermal atomic layer etching of aluminum oxide thin films

Machine learning-based modeling and operation of plasma-enhanced atomic layer deposition of hafnium oxide thin films

Multiscale computational fluid dynamics modeling and reactor design of plasma-enhanced atomic layer deposition

Numerical modeling of carrier gas flow in atomic layer deposition vacuum reactor: A comparative study of lattice Boltzmann models

Atomistic-mesoscopic modeling of area-selective thermal atomic layer deposition

Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films

Microscopic modeling and optimal operation of plasma enhanced atomic layer deposition

3D kinetic Monte-Carlo simulations of diamond growth on (1 0 0) surfaces

A combined molecular dynamics/Monte Carlo simulation of Cu thin film growth on TiN substrates: Illustration of growth mechanisms and comparison with experiments

A kinetic Monte Carlo model for the growth and etching of graphene during chemical vapor deposition

Applying sputtering theory to directional atomic layer etching

Atomistic kinetic Monte Carlo simulation on atomic layer deposition of TiN thin film

Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer

CrystalGrower: a generic computer program for Monte Carlo modelling of crystal growth

Dynamic behavior of clusters in the early stage of SiC (0001) epitaxial growth: A Kinetic Monte Carlo study

Etching mechanisms, kinetics, and pattern formation in multilayered WSe2

Formation of Ag and Co nanowires at the step of the Cu(100) vicinal surfaces: A kinetic Monte Carlo study

Formation of GaAs nanostructures by droplet epitaxy—Monte Carlo simulation

Interaction of F atoms with SiOCH ultra low-k films. Part II: etching

Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator

Kinetic Monte Carlo Simulation of the Growth of AlN Films by Metal Organic Chemical Vapor Deposition

Kinetic Monte Carlo Study of the Atomic Layer Deposition of Zinc Oxide

Kinetic Monte Carlo modeling of oxide thin film growth

Kinetic Monte Carlo simulations of quantum dot self-assembly

Large-scale epitaxial growth kinetics of graphene: A kinetic Monte Carlo study

Lattice kinetic Monte Carlo simulation of epitaxial growth of silicon thin films in H2/SiH4 chemical vapor deposition systems

Lattice kinetic Monte Carlo simulation study of the early stages of epitaxial GaN(0001) growth

Mechanism of substrate-induced anisotropic growth of monolayer WS2 by kinetic Monte Carlo simulations

Microscopic and data-driven modeling and operation of thermal atomic layer etching of aluminum oxide thin films

Microscopic origins of anisotropy for the epitaxial growth of 3C-SiC (0001) vicinal surface: A kinetic Monte Carlo study

Monte Carlo simulation of nanoscale material focused ion beam gas-assisted etching: Ga+ and Ne+ etching of SiO2 in the presence of a XeF2 precursor gas

Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design

Particle Shape Control via Etching of Core@Shell Nanocrystals

SiO2 etching in an Ar/c-C4F8/O2 dual frequency capacitively coupled plasma

Simulation of Epitaxial Growth by Means of Density Functional Theory, Kinetic Monte Carlo, and Phase Field Methods (Handbook of Crystal Growth, Ch. 12)

Simulation of cryogenic silicon etching under SF6/O2/Ar plasma discharge

Stepped morphology on vicinal 3C- and 4H-SiC (0001) faces: A kinetic Monte Carlo study

Study on the competitive growth mechanism of SiC polytypes using Kinetic Monte Carlo method

The complementary graphene growth and etching revealed by large-scale kinetic Monte Carlo simulation

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method

Three-dimensional kinetic Monte Carlo simulations of diamond chemical vapor deposition

Two-dimensional Monte Carlo–Voronoi simulation of grain growth and nucleation in the heat affected zone of TWIP-Ti welds

Unraveling Kinetically-Driven Mechanisms of Gold Nanocrystal Shape Transformations Using Graphene Liquid Cell Electron Microscopy

Kinetic Monte Carlo simulations of the dry reforming of methane catalyzed by the Ru (0001) surface based on density functional theory calculations

Machine learning-based modeling and operation for ALD of SiO2 thin-films using data from a multiscale CFD simulation

Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design

Simulation of plasma-assisted catalytic reduction of NOx, CO, and HC from diesel engine exhaust with COMSOL

Beware of symmetry breaking and periodic flow regimes in axisymmetric CVD reactor setups

Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

Fluid simulation of the plasma uniformity in new multi-directional source capacitively coupled plasma

Impact of precursor exposure on process efficiency and film properties in spatial atomic layer deposition

Influence of the Geometric Parameters on the Deposition Mode in Spatial Atomic Layer Deposition: A Novel Approach to Area-Selective Deposition

Investigation on the parameter distribution of Ar/O2 inductively coupled plasmas

Lecture: Kinetic Monte Carlo Simulations

Modified Fluid Simulation of an Inductively Coupled Plasma Discharge

Multiscale Modeling of Low Pressure Plasma Etching Processes: Linking the Operating Parameters of the Plasma Reactor with Surface Roughness Evolution

Multiscale modeling and neural network model based control of a plasma etch process

On the effect of self-sustained periodic flows on film thickness non-uniformity during CVD

Parametric Study of Plasma Characteristics and Carbon Nanofibers Growth in PECVD System: Numerical Modeling

Pulsed Inductively Coupled Plasma Discharge Simulation for Semiconductor Processing in 2D Axisymmetric Structure

Simulation study of an inductively coupled plasma discharge with different copper coil designs and gas compositions

Two-Dimensional Fluid Simulation of Large-Scale, Capacitively-Coupled Plasma Discharge for Display Device Processes

Unravelling camphor mediated synthesis of TiO2 nanorods over shape memory alloy for efficient energy harvesting

저온·저진공 고분자 증착 Reactor 설계 및 응용방안에 대한 연구 (Research on Low-temperature and Low-vacuum polymer deposition reactor design and application methods)